화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Sulfur passivation for the formation of Si-terminated Al2O3/SiGe(001) interfaces
Sardashti K, Hu KT, Tang KC, Park S, Kim H, Madisetti S, McIntyre P, Oktyabrsky S, Siddiqui S, Sahu B, Yoshida N, Kachian J, Kummel A
Applied Surface Science, 366, 455, 2016
2 Characterization of interface and border traps in ALD Al2O3/GaN MOS capacitors with two-step surface pretreatments on Ga-polar GaN
Gu S, Chagarov EA, Min J, Madisetti S, Novak S, Oktyabrsky S, Kerr AJ, Kaufman-Osborn T, Kummel AC, Asbeck PM
Applied Surface Science, 317, 1022, 2014
3 All in-situ GaSb MOS structures on GaAs (001): Growth, passivation and high-k oxides
Tokranov V, Madisetti S, Yakimov M, Nagaiah P, Faleev N, Oktyabrsky S
Journal of Crystal Growth, 378, 631, 2013
4 Improvement of the GaSb/Al2O3 interface using a thin InAs surface layer
Greene A, Madisetti S, Nagaiah P, Yakimov M, Tokranov V, Moore R, Oktyabrsky S
Solid-State Electronics, 78, 56, 2012