화학공학소재연구정보센터
검색결과 : 49건
No. Article
1 A Natural Silk Fibroin Protein-Based Transparent Bio-Memristor
Hota MK, Bera MK, Kundu B, Kundu SC, Maiti CK
Advanced Functional Materials, 22(21), 4493, 2012
2 Sputter-Deposited La2O3 on p-GaAs for Gate Dielectric Applications
Das T, Mahata C, Maiti CK, Dalapati GK, Chia CK, Chi DZ, Chiam SY, Seng HL, Tan CC, Hui HK, Sutradhar G, Bose PK
Journal of the Electrochemical Society, 159(2), G15, 2012
3 Interface Properties of Mixed (TiO2)(1-x)(Y2O3)(x) and (Ta2O5)(1-x)(Y2O3)(x) (0 <= x <= 1) Gate Dielectrics on Sulfur-Passivated GaAs
Das T, Mahata C, Mallik S, Varma S, Sutradhar G, Bose PK, Maiti CK
Journal of the Electrochemical Society, 159(3), H323, 2012
4 Degradation and breakdown characteristics of Al/HfYOx/GaAs capacitors
Miranda E, Mahata C, Das T, Sune J, Maiti CK
Thin Solid Films, 520(7), 2956, 2012
5 Studies on switching mechanisms in Pd-nanodot embedded Nb2O5 memristors using scanning tunneling microscopy
Hota MK, Bera MK, Verma S, Maiti CK
Thin Solid Films, 520(21), 6648, 2012
6 Electrical properties and noise characterization of HfO2 gate dielectrics on strained SiGe layers
Mallik S, Mukherjee C, Mahata C, Hota MK, Das T, Dalapati GK, Gao H, Kumar MK, Chi DZ, Sarkar CK, Maiti CK
Thin Solid Films, 522, 267, 2012
7 Flatband Voltage Characteristics of Hf-Incorporated Y2O3/Strained-Si Gate Stacks with Au, Pt, and Ni Metal Gates
Mahata C, Das T, Mallik S, Hota MK, Varma S, Maiti CK
Electrochemical and Solid State Letters, 14(2), H80, 2011
8 Chemical Bonding States of Plasma Nitrided High-k/Ge Gate Stack
Mahata C, Das T, Mallik S, Hota MK, Maiti CK
Electrochemical and Solid State Letters, 14(4), H167, 2011
9 Surface Passivation of GaAs Substrates with SiO2 Deposited Using ALD
Dalapati GK, Chia CK, Mahata C, Das T, Maiti CK, Kumar MK, Gao H, Chiam SY, Tan CC, Chua CT, Cheng YB, Chi DZ
Electrochemical and Solid State Letters, 14(10), G52, 2011
10 Impact of Top (Pt, Au, and Al) Electrodes on HfAlOx-Based MIM Capacitors
Hota MK, Mahata C, Mallik S, Sarkar CK, Maiti CK
Journal of the Electrochemical Society, 158(1), H44, 2011