화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Etching of high-k dielectric Zr1-xAlxOy films in chlorine-containing plasmas
Pelhos K, Donnelly VM, Kornblit A, Green ML, Van Dover RB, Manchanda L, Hu Y, Morris M, Bower E
Journal of Vacuum Science & Technology A, 19(4), 1361, 2001
2 Crystallization kinetics in amorphous (Zr0.62Al0.38)O-1.8 thin films
van Dover RB, Lang DV, Green ML, Manchanda L
Journal of Vacuum Science & Technology A, 19(6), 2779, 2001