화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Influence of O-2 partial pressure on the growth of nanostructured anatase phase TiO2 thin films prepared by DC reactive magnetron sputtering
Serio S, Jorge MEM, Maneira MJP, Nunes Y
Materials Chemistry and Physics, 126(1-2), 73, 2011
2 Characterization of nickel implanted alpha-Al(2)O(3)
Marques C, Franco N, da Silva RC, Wemans A, Maneira MJP, Alves E
Materials Science Forum, 514-516, 348, 2006
3 Current-pressure characteristics of planar magnetron discharges in rare gases
Escrivao ML, Pereira PJS, Cabral MH, Teixeira MR, Maneira MJP
Journal of Vacuum Science & Technology A, 22(6), 2361, 2004
4 In-situ GIXRD characterization of the crystallization of Ni-Ti sputtered thin films
Martins RMS, Silva RJC, Fernandes FMB, Pereira L, Gordo PR, Maneira MJP, Schell N
Materials Science Forum, 455-456, 342, 2004
5 Current-pressure-voltage characteristics in a planar magnetron discharge
Escrivao ML, Pereira PJS, Cabral MH, Teixeira CMR, Maneira MJP
Journal of Vacuum Science & Technology A, 21(2), 375, 2003