검색결과 : 16건
| No. | Article |
|---|---|
| 1 |
Image placement issues for ITO-based step and flash imprint lithography templates Nordquist KJ, Ainley ES, Mancini DP, Dauksher WJ, Gehoski KA, Baker J, Resnick DJ, Masnyj Z, Mangat PJS Journal of Vacuum Science & Technology B, 22(2), 695, 2004 |
| 2 |
Extreme ultraviolet mask fabrication with high inspection contrast TaSiNx absorber stack Wasson JR, Weisbrod EJ, Lu B, Mangat PJS, Dauksher WJ, Resnick DJ, Sohn J, Engelstad R, Pettibone D Journal of Vacuum Science & Technology B, 21(6), 3086, 2003 |
| 3 |
Proximity and heating effects during electron-beam patterning of ultraviolet lithography masks Lu B, Wasson JR, Weisbrod EJ, Masnyj Z, Mangat PJS, Nordquist K, Resnick D Journal of Vacuum Science & Technology B, 20(6), 3029, 2002 |
| 4 |
Thermal modeling of extreme ultraviolet and step and flash imprint lithography substrates during dry etch Weisbrod EJ, Dauksher WJ, Zhang D, Rauf S, Mangat PJS, Ventzek PLG, Smith KH, Clemens SB, Martin CJ, Engelstad RL Journal of Vacuum Science & Technology B, 20(6), 3047, 2002 |
| 5 |
Writing, repairing, and inspecting of extreme ultraviolet lithography reticles considering the impact of the materials Wasson JR, Lu B, Mangat PJS, Nordquist K, Resnick DJ Journal of Vacuum Science & Technology B, 19(6), 2635, 2001 |
| 6 |
Pattern placement correction methodology for 200 mm SCALPEL masks Ocola LE, Farrow RC, Kasica RJ, Caminos CG, Rutberg L, Fullowan RF, Teffeau K, Blakey MI, Peabody ML, Knurek CS, Bogart GR, Novembre AE, Liddle JA, Lercel M, Magg C, Collins K, Trybendis M, Cadwell N, Jeffer R, Dauksher WJ, Resnick DJ, Mancini D, Han SI, Masnyj Z, Smith K, Mangat PJS Journal of Vacuum Science & Technology B, 19(6), 2659, 2001 |
| 7 |
Cr absorber etch process for extreme ultraviolet lithography mask fabrication Smith KH, Wasson JR, Mangat PJS, Dauksher WJ, Resnick DJ Journal of Vacuum Science & Technology B, 19(6), 2906, 2001 |
| 8 |
Modeling and development of a deep silicon etch process for 200 mm election projection lithography mask fabrication Dauksher WJ, Clemens SB, Resnick DJ, Smith KH, Mangat PJS, Rauf S, Ventzek PLG, Ashraf H, Lea L, Hall S, Johnston IR, Hopkins J, Chambers A, Bhardwaj JK Journal of Vacuum Science & Technology B, 19(6), 2921, 2001 |
| 9 |
Surface modification and cleaning enhancement of TaSi(N) films with dilute hydrofluoric acid Mangat PJS, Dauksher WJ, Whig R, O'Brien WL Journal of Vacuum Science & Technology A, 18(4), 1211, 2000 |
| 10 |
Characterization of plasma enhanced chemical vapor deposited SiC and its application in advanced reticle technology-scattering with angular limitation in projection electron beam lithography membrane Han SI, Mangat PJS, Smith SM, Dauksher WJ, Convey D, Gregory RB Journal of Vacuum Science & Technology A, 18(4), 1225, 2000 |