화학공학소재연구정보센터
검색결과 : 10건
No. Article
1 Heterogeneous growth of continuous ZIF-8 films on low-temperature amorphous silicon
Monforte F, Mannino G, Alberti A, Smecca E, Italia M, Motta A, Tudisco C, Condorelli GG
Applied Surface Science, 473, 182, 2019
2 Transparent conductive polymer obtained by in-solution doping of PEDOT:PSS
Lombardo V, D'Urso L, Mannino G, Scalese S, Spucches D, La Magna A, Terrasi A, Puglisi RA
Polymer, 155, 199, 2018
3 Molecular doping applied to Si nanowires array based solar cells
Puglisi RA, Garozzo C, Bongiorno C, Di Franco S, Italia M, Mannino G, Scalese S, La Magna A
Solar Energy Materials and Solar Cells, 132, 118, 2015
4 Structural properties of hydrogenated microcrystalline silicon-carbon alloys deposited by Radio Frequency Plasma Enhanced Chemical Vapor Deposition: Effect of microcrystalline silicon seed layer and methane flow rate
Gaiaschi S, Ruggeri R, Johnson EV, Bulkin P, Chapon P, Gueunier-Farret ME, Mannino G, Longeaud C, Kleider JP
Thin Solid Films, 550, 312, 2014
5 Structural properties of pulsed laser deposited SnOx thin films
Fazio E, Neri F, Ruggeri R, Sabatino G, Trusso S, Mannino G
Applied Surface Science, 257(7), 2520, 2011
6 Crystallization of Deposited Amorphous Silicon by Infrared Laser Irradiation
Ruggeri R, Privitera V, Spinella C, Fazio E, Neri F, De Bastiani R, Grimaldi MG, Di Stefano MA, Di Marco S, Mannino G
Journal of the Electrochemical Society, 158(1), H25, 2011
7 Boron electrical activation in crystalline Si after millisecond nonmelting laser irradiation
Mannino G, La Magna A, Privitera V, Christensen JS, Vines L, Svensson BG
Journal of the Electrochemical Society, 155(8), H603, 2008
8 Effect of oxygen on the diffusion of nitrogen implanted in silicon
Mannino G, Privitera V, Scalese S, Libertino S, Napolitani E, Pichler P, Cowern NEB
Electrochemical and Solid State Letters, 7(8), G161, 2004
9 Redistribution and electrical activation of ultralow energy implanted boron in silicon following laser annealing
Whelan S, Privitera V, Italia M, Mannino G, Bongiorno C, Spinella C, Fortunato G, Mariucci L, Stanizzi M, Mittiga A
Journal of Vacuum Science & Technology B, 20(2), 644, 2002
10 Depth profiling of ultrashallow B implants in silicon using a magnetic-sector secondary ion mass spectrometry instrument
Napolitani E, Carnera A, Storti R, Privitera V, Priolo F, Mannino G, Moffatt S
Journal of Vacuum Science & Technology B, 18(1), 519, 2000