화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 Transient measurement of resist charging during electron beam exposure
Bai M, Meisburger WD, Pease RFW
Journal of Vacuum Science & Technology B, 21(1), 106, 2003
2 Distributed axis electron beam technology for maskless lithography and defect inspection
Pickard DS, Groves TR, Meisburger WD, Crane T, Pease RF
Journal of Vacuum Science & Technology B, 21(6), 2834, 2003
3 Distributed axis electron-beam system for lithography and inspection - preliminary experimental results
Pickard DS, Campbell C, Crane T, Cruz-Rivera LJ, Davenport A, Meisburger WD, Pease RFW, Groves TR
Journal of Vacuum Science & Technology B, 20(6), 2662, 2002
4 Correcting for global space charge by positive ion generation
Crane T, Campbell C, Pickard D, Han LQ, Takahashi K, Meisburger WD, Pease RF
Journal of Vacuum Science & Technology B, 20(6), 2709, 2002
5 Stochastic Coulomb interaction effect in ion-neutralized electron-beam projection optics
Takahashi K, Han LQ, Pease RF, Meisburger WD
Journal of Vacuum Science & Technology B, 19(6), 2572, 2001
6 Scaled measurements of global space-charge induced image blur in electron beam projection system
Han LQ, Pease RF, Meisburger WD, Winograd GI, Takahashi K
Journal of Vacuum Science & Technology B, 18(6), 2999, 2000
7 Space-charge-induced aberrations
Winograd GI, Meisburger WD, Pease RFW
Journal of Vacuum Science & Technology B, 17(6), 2803, 1999
8 Field size versus column shortness in high throughput electron beam lithography
Han L, Pease RFW, Meisburger WD, Winograd GI, McCord MA
Journal of Vacuum Science & Technology B, 17(6), 2830, 1999