검색결과 : 8건
No. | Article |
---|---|
1 |
Transient measurement of resist charging during electron beam exposure Bai M, Meisburger WD, Pease RFW Journal of Vacuum Science & Technology B, 21(1), 106, 2003 |
2 |
Distributed axis electron beam technology for maskless lithography and defect inspection Pickard DS, Groves TR, Meisburger WD, Crane T, Pease RF Journal of Vacuum Science & Technology B, 21(6), 2834, 2003 |
3 |
Distributed axis electron-beam system for lithography and inspection - preliminary experimental results Pickard DS, Campbell C, Crane T, Cruz-Rivera LJ, Davenport A, Meisburger WD, Pease RFW, Groves TR Journal of Vacuum Science & Technology B, 20(6), 2662, 2002 |
4 |
Correcting for global space charge by positive ion generation Crane T, Campbell C, Pickard D, Han LQ, Takahashi K, Meisburger WD, Pease RF Journal of Vacuum Science & Technology B, 20(6), 2709, 2002 |
5 |
Stochastic Coulomb interaction effect in ion-neutralized electron-beam projection optics Takahashi K, Han LQ, Pease RF, Meisburger WD Journal of Vacuum Science & Technology B, 19(6), 2572, 2001 |
6 |
Scaled measurements of global space-charge induced image blur in electron beam projection system Han LQ, Pease RF, Meisburger WD, Winograd GI, Takahashi K Journal of Vacuum Science & Technology B, 18(6), 2999, 2000 |
7 |
Space-charge-induced aberrations Winograd GI, Meisburger WD, Pease RFW Journal of Vacuum Science & Technology B, 17(6), 2803, 1999 |
8 |
Field size versus column shortness in high throughput electron beam lithography Han L, Pease RFW, Meisburger WD, Winograd GI, McCord MA Journal of Vacuum Science & Technology B, 17(6), 2830, 1999 |