검색결과 : 18건
| No. | Article |
|---|---|
| 1 |
Direct correlation between the measured electrochemical capacitance, wettability and surface functional groups of CarbonNanosheets Deheryan S, Cott DJ, Mertens PW, Heyns M, Vereecken PM Electrochimica Acta, 132, 574, 2014 |
| 2 |
Correlation of Collapse Forces Determined by Lateral Force AFM with Damage Generation due to Physical Cleaning Processes Pacco A, Kim TG, Mertens PW Electrochemical and Solid State Letters, 14(9), H380, 2011 |
| 3 |
Removal of High-Dose Ion-Implanted 248 nm Deep UV Photoresist Using UV Irradiation and Organic Solvent Tsvetanova D, Vos R, Vanstreels K, Radisic D, Sonnemans R, Berry I, Waldfried C, Mattson D, DeLuca J, Vereecke G, Mertens PW, Parac-Vogt TN, Heyns MM Journal of the Electrochemical Society, 158(2), H150, 2011 |
| 4 |
Germanium MOSFET devices: Advances in materials understanding, process development, and electrical performance Brunco DP, De Jaeger B, Eneman G, Mitard J, Hellings G, Satta A, Terzieva V, Souriau L, Leys FE, Pourtois G, Houssa M, Winderickx G, Vrancken E, Sioncke S, Opsomer K, Nicholas G, Caymax M, Stesmans A, Van Steenbergen J, Mertens PW, Meuris M, Heyns MM Journal of the Electrochemical Society, 155(7), H552, 2008 |
| 5 |
Chemical and structural modifications in a 193-nm photoresist after low-k dry etch Kesters E, Claes M, Le QT, Lux M, Franquet A, Vereecke G, Mertens PW, Frank MM, Carleer R, Adriaensens P, Biebuyk JJ, Bebelman S Thin Solid Films, 516(11), 3454, 2008 |
| 6 |
Study of the carry-over layer and its importance for wet processing of semiconductor substrates Fyen W, Mertens PW Journal of the Electrochemical Society, 153(5), G443, 2006 |
| 7 |
Fundamental study of the removal mechanisms of nano-sized particles using brush scrubber cleaning Xu K, Vos R, Vereecke G, Doumen G, Fyen W, Mertens PW, Heyns MM, Vinckier C, Fransaer J, Kovacs F Journal of Vacuum Science & Technology B, 23(5), 2160, 2005 |
| 8 |
Particle adhesion and removal mechanisms during brush scrubber cleaning Xu K, Vos R, Vereecke G, Doumen G, Fyen W, Mertens PW, Heyns MM Journal of Vacuum Science & Technology B, 22(6), 2844, 2004 |
| 9 |
Silicon surface roughening mechanisms in ammonia hydrogen peroxide mixtures Knotter DM, de Gendt S, Mertens PW, Heyns MM Journal of the Electrochemical Society, 147(2), 736, 2000 |
| 10 |
Evaluation of time-of-flight secondary ion mass spectrometry for metal contamination monitoring on Si wafer surfaces De Witte H, De Gendt S, Douglas M, Conard T, Kenis K, Mertens PW, Vandervorst W, Gijbels R Journal of the Electrochemical Society, 147(5), 1915, 2000 |