검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Permittivity and conductivity of low-dielectric-constant SiOC : H films deposited by plasma-enhanced chemical vapor deposition Gonon P, Sylvestre A, Meynen H, Van Cotthem L Journal of the Electrochemical Society, 150(3), F47, 2003 |
| 2 |
Process optimization and integration of trimethylsilane-deposited alpha-SiC : H and alpha-SiCO : H dielectric thin films for damascene processing Gray WD, Loboda MJ, Bremmer JN, Struyf H, Lepage M, Van Hove M, Donaton RA, Sleeckx E, Stucchi M, Lanckmans F, Gao T, Boullart W, Coenegrachts B, Maenhoudt M, Vanhaelemeersch S, Meynen H, Maex K Journal of the Electrochemical Society, 150(7), G404, 2003 |
| 3 |
Properties of porous HSQ-based films capped by plasma enhanced chemical vapor deposition dielectric layers Iacopi F, Baklanov MR, Sleeckx E, Conrad T, Bender H, Meynen H, Maex K Journal of Vacuum Science & Technology B, 20(1), 109, 2002 |