화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Assessing the mask clamping ability of a low thermal expansion material chuck
Zeuske JR, Vukkadala P, Engelstad RL, Mikkelson AR, Kalkowski G, Risse S, Mueller S
Journal of Vacuum Science & Technology B, 28(6), C6E17, 2010
2 Analysis of Coulomb and Johnsen-Rahbek electrostatic chuck performance for extreme ultraviolet lithography
Sogard MR, Mikkelson AR, Nataraju M, Turner KT, Engelstad RL
Journal of Vacuum Science & Technology B, 25(6), 2155, 2007
3 Distortion of chucked extreme ultraviolet reticles from entrapped particles
Ramaswamy V, Engelstad RL, Turner KT, Mikkelson AR, Veeraraghavan S
Journal of Vacuum Science & Technology B, 24(6), 2829, 2006
4 Electrostatic chucking for extreme ultraviolet lithography: Simulations and experiments
Nataraju M, Sohn J, Veeraraghavan S, Mikkelson AR, Turner KT, Engelstad RL, Van Peski CK, Orvek KJ
Journal of Vacuum Science & Technology B, 24(6), 2834, 2006
5 Predicting critical dimension uniformity in advanced electron-beam projection lithography masks
Cotte EP, Mikkelson AR, Matesanz O, Engelstad RL, Lovell EG, Reu PL
Journal of Vacuum Science & Technology B, 21(6), 3027, 2003