화학공학소재연구정보센터
검색결과 : 7건
No. Article
1 Role of Electron-Ion Dissociative Recombination in CH4 Microwave Plasma on Basis of Simulations and Measurements of Electron Energy
Minea T, van de Steeg AW, Wolf B, da Silva AS, Peeters FJJ, van den Bekerom DCM, Butterworth T, Ong Q, van de Sanden MCM, van Rooij GJ
Plasma Chemistry and Plasma Processing, 39(5), 1275, 2019
2 Oxygen incorporated during deposition determines the crystallinity of magnetron-sputtered Ta3N5 films
Rudolph M, Vickridge I, Foy E, Alvarez J, Kleider JP, Stanescu D, Magnan H, Herlin-Boime N, Bouchet-Fabre B, Minea T, Hugon MC
Thin Solid Films, 685, 204, 2019
3 Influence of backscattered neutrals on the grain size of magnetron-sputtered TaN thin films
Rudolph M, Lundin D, Foy E, Debongnie M, Hugon MC, Minea T
Thin Solid Films, 658, 46, 2018
4 Improving the degree of crystallinity of magnetron-sputtered Ta3N5 thin films by augmenting the ion flux onto the substrate
Rudolph M, Demeter A, Foy E, Tiron V, Sirghi L, Minea T, Bouchet-Fabre B, Hugon MC
Thin Solid Films, 636, 48, 2017
5 Interface study between nanostructured tantalum nitride films and carbon nanotubes grown by chemical vapour deposition
Bouchet-Fabre B, Pinault M, Foy E, Hugon MC, Minea T, Mayne-L'Hermitea M
Applied Surface Science, 315, 510, 2014
6 Nanostructured tantalum nitride films as buffer-layer for carbon nanotube growth
Jin C, Delmas M, Aubert P, Alvarez F, Minea T, Hugon MC, Bouchet-Fabre B
Thin Solid Films, 519(12), 4097, 2011
7 Comparative study of the structure of a-CNx and a-CNx : H films using NEXAFS, XPS and FT-IR analysis
Bouchet-Fabre B, Zellama K, Godet C, Ballutaud D, Minea T
Thin Solid Films, 482(1-2), 156, 2005