검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Characterization of ruthenium thin films as capping layer for extreme ultraviolet lithography mask blanks Yan PY, Spiller E, Mirkarimi P Journal of Vacuum Science & Technology B, 25(6), 1859, 2007 |
| 2 |
Growth and printability of multilayer phase defects on extreme ultraviolet mask blanks Liang T, Ultanir E, Zhang G, Park SJ, Anderson E, Gullikson E, Naulleau P, Salmassi F, Mirkarimi P, Spiller E, Baker S Journal of Vacuum Science & Technology B, 25(6), 2098, 2007 |
| 3 |
Lithographic characterization of the printability of programmed extreme ultraviolet substrate defects Naulleau P, Goldberg KA, Anderson EH, Bokor J, Gullikson E, Harteneck B, Jackson K, Olynick D, Salmassi F, Baker S, Mirkarimi P, Spiller E, Walton C, Zhang GJ Journal of Vacuum Science & Technology B, 21(4), 1286, 2003 |
| 4 |
Printing-based performance analysis of the engineering test stand set-2 optic using a synchrotron exposure station with variable sigma Naulleau P, Goldberg KA, Anderson EH, Bokor J, Harteneck B, Jackson K, Olynick D, Salmassi F, Baker S, Mirkarimi P, Spiller E, Walton C, O'Connell D, Yan PY, Zhang GJ Journal of Vacuum Science & Technology B, 21(6), 2697, 2003 |
| 5 |
Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic Naulleau P, Goldberg KA, Anderson EH, Attwood D, Batson P, Bokor J, Denham P, Gullikson E, Harteneck B, Hoef B, Jackson K, Olynick D, Rekawa S, Salmassi F, Blaedel K, Chapman H, Hale L, Mirkarimi P, Soufli R, Spiller E, Sweeney D, Taylor J, Walton C, O'Connell D, Tichenor D, Gwyn CW, Yan PY, Zhang GJ Journal of Vacuum Science & Technology B, 20(6), 2829, 2002 |
| 6 |
Characterization of extreme ultraviolet lithography mask defects by actinic inspection with broadband extreme ultraviolet illumination Park M, Yi M, Mirkarimi P, Larson C, Bokor J Journal of Vacuum Science & Technology B, 20(6), 3000, 2002 |