화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Composition, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering
Shaginyan LR, Misina M, Zemek J, Musil J, Regent F, Britun VF
Thin Solid Films, 408(1-2), 136, 2002
2 Mechanism of the film composition formation during magnetron sputtering of WTi
Shaginyan LR, Misina M, Kadlec S, Jastrabik L, Mackova A, Perina V
Journal of Vacuum Science & Technology A, 19(5), 2554, 2001
3 Electron-Cyclotron-Resonance Plasma-Enhanced Direct-Current Sputtering Discharge with Magnetic-Mirror Plasma-Confinement
Misina M, Setsuhara Y, Miyake S
Journal of Vacuum Science & Technology A, 15(4), 1922, 1997
4 Planar Magnetron Sputtering Discharge Enhanced with Radio-Frequency or Microwave Magnetoactive Plasma
Musil J, Misina M, Hovorka D
Journal of Vacuum Science & Technology A, 15(4), 1999, 1997