검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Investigation of reduction in etch rate of isolated holes in SiOCH Momonoi Y, Yonekura K, Izawa M Thin Solid Films, 516(11), 3564, 2008 |
| 2 |
Mechanism for difference in etched depth between isolated and dense via holes of SiOCH film Momonoi Y, Yonekura K, Izawa M Journal of Vacuum Science & Technology A, 24(4), 1431, 2006 |
| 3 |
Deposition control for reduction of 193 nm photoresist degradation in dielectric etching Negishi N, Takesue H, Sumiya M, Yoshida T, Momonoi Y, Izawa M Journal of Vacuum Science & Technology B, 23(1), 217, 2005 |
| 4 |
Dry cleaning technique for particle removal based on gas-flow and down-flow plasma Momonoi Y, Yokogawa K, Izawa M Journal of Vacuum Science & Technology B, 22(1), 268, 2004 |