화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 Study of high-temperature Smart Cut (TM): Application to silicon-on-sapphire films and to thin foils of single crystal silicon
Meyer R, Kononchuck O, Moriceau H, Lemiti M, Bruel M
Solid-State Electronics, 115, 225, 2016
2 Atomic scale fabrication of dangling bond structures on hydrogen passiyated Si(001) wafers processed and nanopackaged in a clean room environment
Kolmer M, Godlewski S, Zuzak R, Wojtaszek M, Rauer C, Thuaire A, Hartmann JM, Moriceau H, Joachim C, Szymonski M
Applied Surface Science, 288, 83, 2014
3 H2O Diffusion Barriers at Si-Si Direct Bonding Interfaces for Low Temperature Anneals
Moriceau H, Rieutord F, Libralesso L, Ventosa C, Fournel F, Morales C, Mc Cormick T, Chevolleau T, Radu I
Journal of the Electrochemical Society, 158(9), H919, 2011
4 Mechanism of Thermal Silicon Oxide Direct Wafer Bonding
Ventosa C, Morales C, Libralesso L, Fournel F, Papon AM, Lafond D, Moriceau H, Penot JD, Rieutord F
Electrochemical and Solid State Letters, 12(10), H373, 2009
5 Prebonding Thermal Treatment in Direct Si-Si Hydrophilic Wafer Bonding
Ventosa C, Rieutord F, Libralesso L, Fournel F, Morales C, Moriceau H
Journal of the Electrochemical Society, 156(11), H818, 2009
6 Backside and frontside depth profiling of B delta doping, at low energy, using new and previous magnetic SIMS instruments
Laugier F, Hartmann JM, Moriceau H, Holliger P, Truche R, Dupuy JC
Applied Surface Science, 231-2, 668, 2004
7 Engineering strained silicon on insulator wafers with the Smart Cut (TM) technology
Ghyselen B, Hartmann JM, Ernst T, Aulnette C, Osternaud B, Bogumilowicz Y, Abbadie A, Besson P, Rayssac O, Tiberj A, Daval N, Cayrefourq I, Fournel F, Moriceau H, Di Nardo C, Andrieu F, Paillard V, Cabie M, Vincent L, Snoeck E, Cristiano F, Rocher A, Ponchet A, Claverie A, Boucaud P, Semeria MN, Bensahel D, Kernevez B, Mazure C
Solid-State Electronics, 48(8), 1285, 2004
8 Nanometric patterning with ultrathin twist bonded silicon wafers
Fournel F, Moriceau H, Magnea N, Eymery J, Buttard D, Rouviere JL, Rousseau K, Aspar B
Thin Solid Films, 380(1-2), 10, 2000