화학공학소재연구정보센터
검색결과 : 12건
No. Article
1 Sputtered cuprous oxide thin films and nitrogen doping by ion implantation
Sberna PM, Crupi I, Moscatelli F, Privitera V, Simone F, Miritello M
Thin Solid Films, 600, 71, 2016
2 Carbon-Cap for Ohmic Contacts on Ion-Implanted 4H-SiC
Nipoti R, Mancarella F, Moscatelli F, Rizzoli R, Zampolli S, Ferri M
Electrochemical and Solid State Letters, 13(12), H432, 2010
3 Ar annealing at 1600 degrees C and 1650 degrees C of Al+ implanted p(+)/n 4H-SiC diodes: Analysis of the J-V characteristics versus annealing temperature
Bergamini F, Moscatelli F, Canino M, Poggi A, Nipoti R
Materials Science Forum, 483, 625, 2005
4 n(+)/p diodes realized in SiC by phosphorus ion implantation: Electrical characterization as a function of temperature
Canino M, Castaldini A, Cavallini A, Moscatelli F, Nipoti R, Poggi A
Materials Science Forum, 483, 649, 2005
5 Ni-silicide contacts to 6H-SiC: Contact resistivity and barrier height on ion implanted n-type and barrier height on p-type epilayer
Moscatelli F, Scorzoni A, Poggi A, Canino M, Nipoti R
Materials Science Forum, 483, 737, 2005
6 Measurements of charge collection efficiency of p(+)/n junction SiC detectors
Moscatelli F, Scorzoni A, Poggi A, Bruzzi M, Lagomarsino S, Mersi S, Sciortino S, Lazar M, Di Placido A, Nipoti R
Materials Science Forum, 483, 1021, 2005
7 Contact resistivity and barrier height of Al/Ti ohmic contacts on p-type ion implanted 4H-and 6H-SiC
Scorzoni A, Moscatelli F, Poggi A, Cardinali GC, Nipoti R
Materials Science Forum, 457-460, 881, 2004
8 SiC donor doping by 300 degrees C P implantation: Characterization of the doped layer properties in dependence of the post-implantation annealing temperature
Poggi A, Nipoti R, Moscatelli F, Cardinali GC, Canino M
Materials Science Forum, 457-460, 945, 2004
9 Extraction of the Schottky barrier height of Ti/Al contacts on 4H-SiC from I-V and C-V measurements
Moscatelli F, Scorzoni J, Poggi A, Cardinali GC, Nipoti R
Materials Science Forum, 457-460, 993, 2004
10 Electrical characterization of ion-implanted n(+)/p 6H-SiC diodes
Poggi A, Nipoti R, Cardinali GC, Moscatelli F
Materials Science Forum, 433-4, 621, 2002