화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Influence of substrate bias voltage on the in situ stress measured by an improved optical cantilever technique of sputtered chromium films
Gautier C, Moulard G, Chatelon JP, Motyl G
Thin Solid Films, 384(1), 102, 2001
2 Improvement of the cantilever beam technique for stress measurement during the physical vapor deposition process
Moulard G, Contour G, Motyl G, Gardet G, Courbon M
Journal of Vacuum Science & Technology A, 16(2), 736, 1998