화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Profiling of ultrashallow junctions
Goeckner MJ, Felch SB, Fang Z, Oberhofer A, Chia VKF, Mount GR, Poulakos M, Keenan WA
Journal of Vacuum Science & Technology B, 18(1), 472, 2000
2 Sputtering rate change and surface roughening during oblique and normal incidence O-2(+) bombardment of silicon, with and without oxygen flooding
Magee CW, Mount GR, Smith SP, Herner B, Gossmann HJ
Journal of Vacuum Science & Technology B, 16(6), 3099, 1998