검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Challenges in 1 Teradot/in.(2) dot patterning using electron beam lithography for bit-patterned media Yang X, Xiao S, Wu W, Xu Y, Mountfield K, Rottmayer R, Lee K, Kuo D, Weller D Journal of Vacuum Science & Technology B, 25(6), 2202, 2007 |
| 2 |
Electron beam lithography for magnetic recording heads: Characterization and optimization of critical components Yang XM, Zhou JY, Xiao SG, Mountfield K Journal of Vacuum Science & Technology B, 24(6), 2920, 2006 |
| 3 |
Electron beam lithography for data storage: Quantifying the proximity effect as a function of CAD design and thin metal layers Eckert A, Mountfield K Journal of Vacuum Science & Technology B, 22(6), 2936, 2004 |
| 4 |
Fabrication of sub-50 nm critical feature for magnetic recording device using electron-beam lithography Yang XM, Eckert A, Mountfield K, Gentile H, Seiler C, Brankovic S, Johns E Journal of Vacuum Science & Technology B, 21(6), 3017, 2003 |