검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Measurement of semi-isolated polysilicon gate structure with the optical critical dimension technique Shivaprasad D, Hu JT, Tabet M, Hoobler R, Mui D, Liu W Journal of Vacuum Science & Technology B, 21(6), 2517, 2003 |
| 2 |
In situ measurement of aspect ratio dependent etch rates of polysilicon in an inductively coupled fluorine plasma Lill T, Grimbergen M, Mui D Journal of Vacuum Science & Technology B, 19(6), 2123, 2001 |
| 3 |
Single layer chemical vapor deposition photoresist for 193 nm deep ultraviolet photolithography Nault M, Weidman T, Sugiarto D, Mui D, Lee C, Yang J Journal of Vacuum Science & Technology B, 16(6), 3730, 1998 |