검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Accurate critical dimension control by using an azide/novolak resist process for electron-beam lithography Yamamoto J, Uchino S, Ohta H, Yoshimura T, Murai F Journal of Vacuum Science & Technology B, 15(6), 2868, 1997 |
| 2 |
Process and Device Technologies for 1 Gbit Dynamic Random-Access Memory Cells Kaga T, Ohkura M, Murai F, Yokoyama N, Takeda E Journal of Vacuum Science & Technology B, 13(6), 2329, 1995 |
| 3 |
Prevention of Resist Pattern Collapse by Resist Heating During Rinsing Tanaka T, Morigami M, Oizumi H, Soga T, Ogawa T, Murai F Journal of the Electrochemical Society, 141(12), L169, 1994 |
| 4 |
Application of a High-Throughput Electron-Beam System for 0.3 Mu-M Large-Scale Integration Mizuno F, Kato M, Hayakawa H, Sato K, Hasegawa K, Sakitani Y, Saitou N, Murai F, Shiraishi H, Uchino SI Journal of Vacuum Science & Technology B, 12(6), 3440, 1994 |
| 5 |
Practical Phase-Shifting Mask Technology for 0.3 Mu-M Large-Scale Integrations Mizuno F, Moriuchi N, Hoga M, Koizumi Y, Suga O, Nakaune H, Kamiyama K, Hasegawa N, Murai F, Itoh F Journal of Vacuum Science & Technology B, 12(6), 3799, 1994 |
| 6 |
High-Speed Single-Layer-Resist Process and Energy-Dependent Aspect Ratios for 0.2-Mu-M Electron-Beam Lithography Murai F, Yamamoto J, Yamaguchi H, Okazaki S, Sato K, Hasegawa K, Hayakawa H Journal of Vacuum Science & Technology B, 12(6), 3874, 1994 |
| 7 |
Development of Positive Electron-Beam Resist for 50 kv Electron-Beam Direct-Writing Lithography Sakamizu T, Yamaguchi H, Shiraishi H, Murai F, Ueno T Journal of Vacuum Science & Technology B, 11(6), 2812, 1993 |