화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Depth Profiling of La2O3/HfO2 Stacked Dielectrics for Nanoelectronic Device Applications
Alshareef HN, Mure S, Majhi P, Quevedo-Lopez MA
Electrochemical and Solid State Letters, 14(3), H139, 2011
2 Depth profile analysis of helium in silicon with high-resolution elastic recoil detection analysis
Tomita M, Akutsu H, Oshima Y, Sato N, Mure S, Fukuyama H, Ichihara C
Journal of Vacuum Science & Technology B, 28(3), 554, 2010
3 Fuzzy Application Procedure (FAP) for the risk assessment of occupational accidents
Mure S, Demichela M
Journal of Loss Prevention in The Process Industries, 22(5), 593, 2009
4 High-resolution Rutherford backscattering spectrometry study on process dependent elemental depth profile change of hafnium silicate on silicon
Ichihara C, Yasuno S, Takeuchi H, Kobayashi A, Mure S, Fujikawa K, Sasakawa K
Journal of Vacuum Science & Technology A, 27(4), 937, 2009
5 ERK1/2 phosphorylate GEF-H1 to enhance its guanine nucleotide exchange activity toward RhoA
Fujishiro SH, Tammura S, Mure S, Kashimoto Y, Watanabe K, Kohno M
Biochemical and Biophysical Research Communications, 368(1), 162, 2008
6 Preliminary risk assessment of ecotoxic substances accidental releases in major risk installations through fuzzy logic
Darbra RM, Demichela M, Mure S
Process Safety and Environmental Protection, 86(B2), 103, 2008