검색결과 : 6건
No. | Article |
---|---|
1 |
Depth Profiling of La2O3/HfO2 Stacked Dielectrics for Nanoelectronic Device Applications Alshareef HN, Mure S, Majhi P, Quevedo-Lopez MA Electrochemical and Solid State Letters, 14(3), H139, 2011 |
2 |
Depth profile analysis of helium in silicon with high-resolution elastic recoil detection analysis Tomita M, Akutsu H, Oshima Y, Sato N, Mure S, Fukuyama H, Ichihara C Journal of Vacuum Science & Technology B, 28(3), 554, 2010 |
3 |
Fuzzy Application Procedure (FAP) for the risk assessment of occupational accidents Mure S, Demichela M Journal of Loss Prevention in The Process Industries, 22(5), 593, 2009 |
4 |
High-resolution Rutherford backscattering spectrometry study on process dependent elemental depth profile change of hafnium silicate on silicon Ichihara C, Yasuno S, Takeuchi H, Kobayashi A, Mure S, Fujikawa K, Sasakawa K Journal of Vacuum Science & Technology A, 27(4), 937, 2009 |
5 |
ERK1/2 phosphorylate GEF-H1 to enhance its guanine nucleotide exchange activity toward RhoA Fujishiro SH, Tammura S, Mure S, Kashimoto Y, Watanabe K, Kohno M Biochemical and Biophysical Research Communications, 368(1), 162, 2008 |
6 |
Preliminary risk assessment of ecotoxic substances accidental releases in major risk installations through fuzzy logic Darbra RM, Demichela M, Mure S Process Safety and Environmental Protection, 86(B2), 103, 2008 |