검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Self-assembled monolayers as Cu diffusion barriers for ultralow-k dielectrics Murthy BR, Yee WM, Krishnamoorthy A, Kumar R, Frye DC Electrochemical and Solid State Letters, 9(7), F61, 2006 |
| 2 |
Effects of plasma treatments on ultralow-k dielectric film and Ta barrier properties in Cu damascene processing Kumar R, Wong TKS, Murthy BR, Wang YH, Balasubramanian N Journal of the Electrochemical Society, 153(5), G420, 2006 |
| 3 |
Localized germanium-on-insulator patterns on Si by novel etching scheme in CF4/O-2 plasma Murthy BR, Balasubramanian N, Balakumar S, Mukherjee-Roy M, Trigg A, Kumar R, Kwong DL Thin Solid Films, 504(1-2), 77, 2006 |
| 4 |
Deep trench etch and clean process technology for CU/SiOC passive device Yu MB, Bliznetsov VN, Chang CK, Murthy BR Thin Solid Films, 462-63, 302, 2004 |