검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Influence of substrate annealing on inducing Ti3+ and oxygen vacancy in TiO2 thin films deposited via RF magnetron sputtering Abdullah SA, Sahdan MZ, Nafarizal N, Saim H, Embong Z, Rohaida CHC, Adriyanto F Applied Surface Science, 462, 575, 2018 |
| 2 |
Sticking probability of Ti atoms in magnetron sputtering deposition evaluated from the spatial distribution of Ti atom density Nafarizal N, Sasaki K Journal of Vacuum Science & Technology A, 25(2), 308, 2007 |
| 3 |
Measurement of Cu atom density in a magnetron sputtering plasma source using an YBaCuO target by laser-induced fluorescence imaging spectroscopy Gao JS, Nafarizal N, Sasaki K Journal of Vacuum Science & Technology A, 24(6), 2100, 2006 |
| 4 |
Deposition profile of Ti film inside a trench and its correlation with gas-phase ionization in high-pressure magnetron sputtering Nafarizal N, Takada N, Nakamura K, Sago Y, Sasaki K Journal of Vacuum Science & Technology A, 24(6), 2206, 2006 |