검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Characterization of low dielectric constant plasma enhanced chemical vapor deposition fluorinated silicon oxide films as intermetal dielectric materials Kim K, Kwon DH, Nallapati G, Lee GS Journal of Vacuum Science & Technology A, 16(3), 1509, 1998 |
| 2 |
Process characterization of plasma enhanced chemical vapor deposition of silicon nitride films with disilane as silicon source Nallapati G, Ajmera PK Journal of Vacuum Science & Technology B, 16(3), 1077, 1998 |