검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
High-aspect-ratio deep Si etching in SF6/O-2 plasma. I. Characteristics of radical reactions with high-aspect-ratio patterns Maruyama T, Narukage T, Onuki R, Fujiwara N Journal of Vacuum Science & Technology B, 28(4), 854, 2010 |
| 2 |
High-aspect-ratio deep Si etching in SF6/O-2 plasma. II. Mechanism of lateral etching in high-aspect-ratio features Maruyama T, Narukage T, Onuki R, Fujiwara N Journal of Vacuum Science & Technology B, 28(4), 862, 2010 |