검색결과 : 23건
| No. | Article |
|---|---|
| 1 |
Effect of carbon contamination on the printing performance of extreme ultraviolet masks Fan YJ, Yankulin L, Antohe A, Thomas P, Mbanaso C, Garg R, Wang YF, Wust A, Goodwin F, Huh S, Naulleau P, Goldberg K, Mochi I, Denbeaux G Journal of Vacuum Science & Technology B, 28(2), 321, 2010 |
| 2 |
Lithographic performance evaluation of a contaminated extreme ultraviolet mask after cleaning George S, Naulleau P, Okoroanyanwu U, Dittmar K, Holfeld C, Wuest A Journal of Vacuum Science & Technology B, 28(4), 841, 2010 |
| 3 |
EUV pattern defect detection sensitivity based on aerial image linewidth measurements Goldberg KA, Mochi I, Naulleau P, Liang T, Yan PY, Huh S Journal of Vacuum Science & Technology B, 27(6), 2916, 2009 |
| 4 |
Iterative procedure for in situ extreme ultraviolet optical testing with an incoherent source Miyakawaa R, Naulleau P, Zakhor A Journal of Vacuum Science & Technology B, 27(6), 2927, 2009 |
| 5 |
Actinic extreme ultraviolet mask inspection beyond 0.25 numerical aperture Goldberg KA, Naulleau P, Mochi I, Anderson EH, Rekawa SB, Kemp CD, Gunion RF, Han HS, Huh S Journal of Vacuum Science & Technology B, 26(6), 2220, 2008 |
| 6 |
Growth and printability of multilayer phase defects on extreme ultraviolet mask blanks Liang T, Ultanir E, Zhang G, Park SJ, Anderson E, Gullikson E, Naulleau P, Salmassi F, Mirkarimi P, Spiller E, Baker S Journal of Vacuum Science & Technology B, 25(6), 2098, 2007 |
| 7 |
Resist-based measurement of the contrast transfer function in a 0.3 numerical aperture extreme ultraviolet microfield optic Cain JP, Naulleau P, Spanos CJ Journal of Vacuum Science & Technology B, 24(1), 326, 2006 |
| 8 |
Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source Naulleau P, Cain JP, Anderson E, Dean K, Denham P, Goldberg KA, Hoef B, Jackson K Journal of Vacuum Science & Technology B, 23(6), 2840, 2005 |
| 9 |
Measuring line roughness through aerial image contrast variation using coherent extreme ultraviolet spatial filtering technique Shumway MD, Naulleau P, Goldberg KA, Bokor JR Journal of Vacuum Science & Technology B, 23(6), 2844, 2005 |
| 10 |
Printability of nonsmoothed buried defects in extreme ultraviolet lithography mask blanks Farys V, Charpin-Nicolle C, Richard M, Robic JY, Muffato V, Quesnel E, Postnikov S, Schiavone P, Besacier M, Smaali R, Naulleau P Journal of Vacuum Science & Technology B, 23(6), 2860, 2005 |