검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry Weilnboeck F, Bruce RL, Engelmann S, Oehrlein GS, Nest D, Chung TY, Graves D, Li M, Wang D, Andes C, Hudson EA Journal of Vacuum Science & Technology B, 28(5), 993, 2010 |
| 2 |
Plasma-surface interactions of advanced photoresists with C4F8/Ar discharges: Plasma parameter dependencies Engelmann S, Bruce RL, Sumiya M, Kwon T, Phaneuf R, Oehrlein GS, Andes C, Graves D, Nest D, Hudson EA Journal of Vacuum Science & Technology B, 27(1), 92, 2009 |
| 3 |
Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma Bruce RL, Engelmann S, Lin T, Kwon T, Phaneuf RJ, Oehrlein GS, Long BK, Willson CG, Vegh JJ, Nest D, Graves DB, Alizadeh A Journal of Vacuum Science & Technology B, 27(3), 1142, 2009 |
| 4 |
Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C4F8-and CF4-based discharges Engelmann S, Bruce RL, Weilnboeck F, Sumiya M, Kwon T, Phaneuf R, Oehrlein GS, Andes C, Graves D, Nest D, Hudson EA Journal of Vacuum Science & Technology B, 27(3), 1165, 2009 |
| 5 |
Ar+ bombardment of 193 nm photoresist: Morphological effects Pargon E, Nest D, Graves DB Journal of Vacuum Science & Technology B, 25(4), 1236, 2007 |
| 6 |
Plasma-surface interactions of model polymers for advanced photoresists using C4F8/Ar discharges and energetic ion beams Engelmann S, Bruce RL, Kwon T, Phaneuf R, Oehrlein GS, Bae YC, Andes C, Graves D, Nest D, Hudson EA, Lazzeri P, Lacob E, Anderle M Journal of Vacuum Science & Technology B, 25(4), 1353, 2007 |