검색결과 : 19건
| No. | Article |
|---|---|
| 1 |
Phase shift mask interferometric birefringence monitor McIntyre GR, Neureuther A Journal of Vacuum Science & Technology B, 24(6), 2808, 2006 |
| 2 |
Screening layouts for high-numerical aperture and polarization effects using pattern matching McIntyre GR, Holwill J, Neureuther A, Capodieci L, Zou Y, Levinson H, Kye J Journal of Vacuum Science & Technology B, 23(6), 2646, 2005 |
| 3 |
Utilizing maximum likelihood deblurring algorithm to recover high frequency components of scanning electron microscopy images Williamson M, Neureuther A Journal of Vacuum Science & Technology B, 22(2), 523, 2004 |
| 4 |
Effects of treatment parameters in electric-field-enhanced postexposure bake Cheng M, Poppe J, Neureuther A Journal of Vacuum Science & Technology B, 21(4), 1428, 2003 |
| 5 |
Algebraic model for the printability of nonplanar phase defects Lam M, Neureuther A Journal of Vacuum Science & Technology B, 21(6), 2815, 2003 |
| 6 |
Pattern and probe-based aberration monitors for the human eye Robins G, Neureuther A Journal of Vacuum Science & Technology B, 21(6), 2922, 2003 |
| 7 |
Measuring optical image aberrations with pattern and probe based targets Robins G, Adam K, Neureuther A Journal of Vacuum Science & Technology B, 20(1), 338, 2002 |
| 8 |
Improving resist resolution and sensitivity via electric-field enhanced postexposure baking Cheng MS, Yuan L, Croffie E, Neureuther A Journal of Vacuum Science & Technology B, 20(2), 734, 2002 |
| 9 |
Polarization contact: Concept and initial assessment Lam M, Neureuther A Journal of Vacuum Science & Technology B, 20(6), 2583, 2002 |
| 10 |
Operational model for pattern and probe based aberration monitors Robins G, Neureuther A Journal of Vacuum Science & Technology B, 20(6), 2610, 2002 |