화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 HBr concentration and temperature measurements in a plasma etch reactor using diode laser absorption spectroscopy
Chou SI, Baer DS, Hanson RK, Collison WZ, Ni TQ
Journal of Vacuum Science & Technology A, 19(2), 477, 2001
2 Studies of the low-pressure inductively-coupled plasma etching for a larger area wafer using plasma modeling and Langmuir probe
Collison WZ, Ni TQ, Barnes MS
Journal of Vacuum Science & Technology A, 16(1), 100, 1998