| 1 |
Reproducible resistance switching for BaTiO3 thin films fabricated by RF-magnetron sputtering
Jung CH, Woo SI, Kim YS, No KS
Thin Solid Films, 519(10), 3291, 2011 |
| 2 |
Effects of N-2 and NH3 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics
Park KS, Baek KH, Kim DP, Woo JC, Do LM, No KS
Applied Surface Science, 257(4), 1347, 2010 |
| 3 |
ZrO2 gate dielectrics produced by ultraviolet ozone oxidation for GaN and AlGaN/GaN transistors
Dora Y, Han S, Klenov D, Hansen PJ, No KS, Mishra UK, Stemmer S, Speck JS
Journal of Vacuum Science & Technology B, 24(2), 575, 2006 |
| 4 |
Theoretical calculation of electronic structure and X-ray absorption near-edge structure of cathode materials for Li ion batteries
Jeon YA, Kim YS, Kim SK, No KS
Solid State Ionics, 177(26-32), 2661, 2006 |
| 5 |
Metallorganic chemical vapor deposition of metallic Ru thin films on biaxially textured Ni substrates using a Ru(EtCp)(2) precursor
Tian HY, Chan HLW, Choy CL, Choi JW, No KS
Materials Chemistry and Physics, 93(1), 142, 2005 |
| 6 |
Preparation and electrochemical characterization of size controlled SnO2-RuO2 composite powder for monolithic hybrid battery
Jeon YA, No KS, Choi SH, Ahn JP, Yoon YS
Electrochimica Acta, 50(2-3), 907, 2004 |
| 7 |
Fabrication and electrochemical characterization of LiCoO2 cathode powder by mechanochemical process
Jeon YA, No KS, Yoon YS
Journal of the Electrochemical Society, 151(11), A1870, 2004 |
| 8 |
Low-temperature growth of carbon nanotubes by thermal chemical vapor deposition using Pd, Cr, and Pt as co-catalyst
Lee CJ, Park J, Kim JM, Huh Y, Lee JY, No KS
Chemical Physics Letters, 327(5-6), 277, 2000 |
| 9 |
Water-induced degradation of chromium fluoride films
Kim EN, Hong SB, Gorman JD, Lim SC, Moon SY, Kim DW, No KS
Thin Solid Films, 324(1-2), 292, 1998 |
| 10 |
Crystallization of Fluoreckermannite in Glass
Baik DS, No KS, Chun JS
Journal of Materials Science Letters, 15(7), 558, 1996 |
