화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Oxygen addition to fluorine based SiN etch process: Impact on the electrical properties of AlGaN/GaN 2DEG and transistor characteristics
Hahn H, Achenbach J, Ketteniss N, Noculak A, Kalisch H, Vescan A
Solid-State Electronics, 67(1), 90, 2012
2 MOVPE, processing and characterization of AlGaN/GaN HEMTs with different Al concentrations on silicon substrates
Fieger M, Eickelkamp M, Koshroo LR, Dikme Y, Noculak A, Kalisch H, Heuken M, Jansen RH, Vescan A
Journal of Crystal Growth, 298, 843, 2007