검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Resolution-limiting factors in low-energy electron-beam proximity projection lithography: Mask, projection, and resist process Yoshizawa M, Oguni K, Nakano H, Amai K, Nohama S, Moriya S, Kitagawa T Journal of Vacuum Science & Technology B, 22(1), 136, 2004 |
| 2 |
Complementary masking approach for proximity electron lithography Omori S, Iwase K, Amai K, Sasaki T, Hane H, Koike K, Nohama S, Ashida I, Kitagawa T, Moriya S Journal of Vacuum Science & Technology B, 21(1), 57, 2003 |