검색결과 : 10건
| No. | Article |
|---|---|
| 1 |
Direct die-to-database electron beam inspection of fused silica imprint templates Resnick DJ, Myron LJ, Thompson E, Hasebe T, Tokumoto T, Yan C, Yamamoto M, Wakamori H, Inoue M, Ainley E, Nordquist KJ, Dauksher WJ Journal of Vacuum Science & Technology B, 24(6), 2979, 2006 |
| 2 |
Image placement issues for ITO-based step and flash imprint lithography templates Nordquist KJ, Ainley ES, Mancini DP, Dauksher WJ, Gehoski KA, Baker J, Resnick DJ, Masnyj Z, Mangat PJS Journal of Vacuum Science & Technology B, 22(2), 695, 2004 |
| 3 |
Fabrication of a surface acoustic wave-based correlator using step-and-flash imprint lithography Cardinale GF, Skinner JL, Talin AA, Brocato RW, Palmer DW, Mancini DP, Dauksher WJ, Gehoski K, Le N, Nordquist KJ, Resnick DJ Journal of Vacuum Science & Technology B, 22(6), 3265, 2004 |
| 4 |
Inspection of templates for imprint lithography Hess HF, Pettibone D, Adler D, Bertsche K, Nordquist KJ, Mancini DP, Dauksher WJ, Resnick DJ Journal of Vacuum Science & Technology B, 22(6), 3300, 2004 |
| 5 |
Repair of step and flash imprint lithography templates Dauksher WJ, Nordquist KJ, Le NV, Gehoski KA, Mancini DP, Resnick DJ, Casoose L, Bozak R, White R, Csuy J, Lee D Journal of Vacuum Science & Technology B, 22(6), 3306, 2004 |
| 6 |
Imprint lithography for integrated circuit fabrication Resnick DJ, Dauksher WJ, Mancini D, Nordquist KJ, Bailey TC, Johnson S, Stacey N, Ekerdt JG, Willson CG, Sreenivasan SV, Schumaker N Journal of Vacuum Science & Technology B, 21(6), 2624, 2003 |
| 7 |
Step and flash imprint lithography template characterization, from an etch perspective Dauksher WJ, Mancini DP, Nordquist KJ, Resnick DJ, Standfast DL, Convey D, Wei Y Journal of Vacuum Science & Technology B, 21(6), 2771, 2003 |
| 8 |
Characterization of and imprint results using indium tin oxide-based step and flash imprint lithography templates Dauksher WJ, Nordquist KJ, Mancini DP, Resnick DJ, Baker JH, Hooper AE, Talin AA, Bailey TC, Lemonds AM, Sreenivasan SV, Ekerdt JG, Willson CG Journal of Vacuum Science & Technology B, 20(6), 2857, 2002 |
| 9 |
Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates Mancini DP, Gehoski KA, Ainley E, Nordquist KJ, Resnick DJ, Bailey TC, Sreenivasan SV, Ekerdt JG, Willson CG Journal of Vacuum Science & Technology B, 20(6), 2896, 2002 |
| 10 |
Comparison of negative resists for 100 nm electron-beam direct write and mask making applications Nordquist KJ, Resnick DJ, Ainley ES Journal of Vacuum Science & Technology B, 16(6), 3289, 1998 |