검색결과 : 6건
No. | Article |
---|---|
1 |
Arsenic redistribution during rapid thermal chemical vapor deposition of TiSi2 on Si Fang H, Ozturk MC, O'Neil PA, Seebauer EG Journal of the Electrochemical Society, 148(2), G43, 2001 |
2 |
Quality of selective silicon epitaxial films deposited using disilane and chlorine O'Neil PA, Ozturk MC, Batchelor AD, Xu MM, Maher DM Journal of the Electrochemical Society, 146(6), 2337, 1999 |
3 |
Effects of oxygen during selective silicon epitaxial growth using disilane and chlorine O'Neil PA, Ozturk MC, Batchelor AD, Xu MM, Maher DM Journal of the Electrochemical Society, 146(6), 2344, 1999 |
4 |
Growth of selective silicon epitaxy using disilane and chlorine on heavily implanted substrates - I. Role of implanted BF2 O'Neil PA, Ozturk MC, Batchelor AD, Venables D, Xu MM, Maher DM Journal of the Electrochemical Society, 146(8), 3070, 1999 |
5 |
Growth of selective silicon epitaxy using disilane and chlorine on heavily implanted substrates - II. Role of implanted arsenic O'Neil PA, Ozturk MC, Batchelor AD, Venables D, Maher DM Journal of the Electrochemical Society, 146(8), 3079, 1999 |
6 |
Solid state structures and dynamic solution equilibria of bis(dibenzylamido)magnesium complexes : Aggregation dependence on stoichiometry and denticity of donor solvent Clegg W, Craig FJ, Henderson KW, Kennedy AR, Mulvey RE, O'Neil PA, Reed D Inorganic Chemistry, 36(27), 6238, 1997 |