화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Arsenic redistribution during rapid thermal chemical vapor deposition of TiSi2 on Si
Fang H, Ozturk MC, O'Neil PA, Seebauer EG
Journal of the Electrochemical Society, 148(2), G43, 2001
2 Quality of selective silicon epitaxial films deposited using disilane and chlorine
O'Neil PA, Ozturk MC, Batchelor AD, Xu MM, Maher DM
Journal of the Electrochemical Society, 146(6), 2337, 1999
3 Effects of oxygen during selective silicon epitaxial growth using disilane and chlorine
O'Neil PA, Ozturk MC, Batchelor AD, Xu MM, Maher DM
Journal of the Electrochemical Society, 146(6), 2344, 1999
4 Growth of selective silicon epitaxy using disilane and chlorine on heavily implanted substrates - I. Role of implanted BF2
O'Neil PA, Ozturk MC, Batchelor AD, Venables D, Xu MM, Maher DM
Journal of the Electrochemical Society, 146(8), 3070, 1999
5 Growth of selective silicon epitaxy using disilane and chlorine on heavily implanted substrates - II. Role of implanted arsenic
O'Neil PA, Ozturk MC, Batchelor AD, Venables D, Maher DM
Journal of the Electrochemical Society, 146(8), 3079, 1999
6 Solid state structures and dynamic solution equilibria of bis(dibenzylamido)magnesium complexes : Aggregation dependence on stoichiometry and denticity of donor solvent
Clegg W, Craig FJ, Henderson KW, Kennedy AR, Mulvey RE, O'Neil PA, Reed D
Inorganic Chemistry, 36(27), 6238, 1997