검색결과 : 16건
No. | Article |
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1 |
Development of a statistical method to help evaluating the transparency/opacity of decorative thin films Oliveira CID, Martinez-Martinez D, Al-Rjoub A, Rebouta L, Menezes R, Cunha L Applied Surface Science, 438, 51, 2018 |
2 |
X-ray photoelectron spectroscopy analyses of titanium oxynitride films prepared by magnetron sputtering using air/Ar mixtures Chan MH, Lu FH Thin Solid Films, 517(17), 5006, 2009 |
3 |
XRR and GISAXS study of silicon oxynitride films Bernstoff S, Dubcek P, Pivac B, Kovacevic I, Sassella A, Borghesi A Applied Surface Science, 253(1), 33, 2006 |
4 |
Interfacial chemistry and structures of ultrathin Si oxynitride films Oshima M, Kimura K, Ono K, Horiba K, Nakamura K, Kumigashira H, Oh JH, Niwa M, Usuda K, Hirashita N Applied Surface Science, 216(1-4), 291, 2003 |
5 |
Thermodynamic study and characterization of low pressure chemically vapor deposited silicon oxynitride films from tetraethylorthosilicate, dichlorosilane and ammonia gas mixtures Vamvakas VE, Davazoglou D, Berjoan R, Schamm S, Vahlas C Thin Solid Films, 429(1-2), 77, 2003 |
6 |
Optical characteristics of sputtered tantalum oxynitride Ta(N,O) films Jong CA, Chin TS Materials Chemistry and Physics, 74(2), 201, 2002 |
7 |
Effect of substrate temperature in SiOxNy films deposited by electron cyclotron resonance del Prado A, Martinez FL, Martil I, Gonzalez-Diaz G, Fernandez M Journal of Vacuum Science & Technology A, 17(4), 1263, 1999 |
8 |
Characterization of SiOxNy anti-reflective coatings using SIMS and RBS/HFS Saleh AA, Rothman JB, Kirchhoff JF, Yota J, Nguyen C Thin Solid Films, 355-356, 363, 1999 |
9 |
A novel nanolithographic concept using crack-assisted patterning and self-alignment technology Gorokhov EB, Prinz VY, Noskov AG, Gavrilova TA Journal of the Electrochemical Society, 145(6), 2120, 1998 |
10 |
Silicon nitride chemical mechanical polishing mechanisms Hu YZ, Gutmann RJ, Chow TP Journal of the Electrochemical Society, 145(11), 3919, 1998 |