화학공학소재연구정보센터
검색결과 : 16건
No. Article
1 Development of a statistical method to help evaluating the transparency/opacity of decorative thin films
Oliveira CID, Martinez-Martinez D, Al-Rjoub A, Rebouta L, Menezes R, Cunha L
Applied Surface Science, 438, 51, 2018
2 X-ray photoelectron spectroscopy analyses of titanium oxynitride films prepared by magnetron sputtering using air/Ar mixtures
Chan MH, Lu FH
Thin Solid Films, 517(17), 5006, 2009
3 XRR and GISAXS study of silicon oxynitride films
Bernstoff S, Dubcek P, Pivac B, Kovacevic I, Sassella A, Borghesi A
Applied Surface Science, 253(1), 33, 2006
4 Interfacial chemistry and structures of ultrathin Si oxynitride films
Oshima M, Kimura K, Ono K, Horiba K, Nakamura K, Kumigashira H, Oh JH, Niwa M, Usuda K, Hirashita N
Applied Surface Science, 216(1-4), 291, 2003
5 Thermodynamic study and characterization of low pressure chemically vapor deposited silicon oxynitride films from tetraethylorthosilicate, dichlorosilane and ammonia gas mixtures
Vamvakas VE, Davazoglou D, Berjoan R, Schamm S, Vahlas C
Thin Solid Films, 429(1-2), 77, 2003
6 Optical characteristics of sputtered tantalum oxynitride Ta(N,O) films
Jong CA, Chin TS
Materials Chemistry and Physics, 74(2), 201, 2002
7 Effect of substrate temperature in SiOxNy films deposited by electron cyclotron resonance
del Prado A, Martinez FL, Martil I, Gonzalez-Diaz G, Fernandez M
Journal of Vacuum Science & Technology A, 17(4), 1263, 1999
8 Characterization of SiOxNy anti-reflective coatings using SIMS and RBS/HFS
Saleh AA, Rothman JB, Kirchhoff JF, Yota J, Nguyen C
Thin Solid Films, 355-356, 363, 1999
9 A novel nanolithographic concept using crack-assisted patterning and self-alignment technology
Gorokhov EB, Prinz VY, Noskov AG, Gavrilova TA
Journal of the Electrochemical Society, 145(6), 2120, 1998
10 Silicon nitride chemical mechanical polishing mechanisms
Hu YZ, Gutmann RJ, Chow TP
Journal of the Electrochemical Society, 145(11), 3919, 1998