검색결과 : 8건
| No. | Article |
|---|---|
| 1 |
Electrical Characterization of a Processing Plasma Chamber Roth WC, Carlile RN, Ohanlon JF Journal of Vacuum Science & Technology A, 15(6), 2930, 1997 |
| 2 |
Particle Formation Rates in Sulfur-Hexafluoride Plasma-Etching of Silicon Garrity MP, Peterson TW, Ohanlon JF Journal of Vacuum Science & Technology A, 14(2), 550, 1996 |
| 3 |
Particle Trapping, Transport, and Charge in Capacitively and Inductively-Coupled Argon Plasmas in a Gaseous-Electronics-Conference-Reference-Cell Collins SM, Brown DA, Ohanlon JF, Carlile RN Journal of Vacuum Science & Technology A, 14(2), 634, 1996 |
| 4 |
Mapping of Radio-Frequency Plasma Potential Throughout a Particle Trapping Region Using an Emissive Probe Kang JW, Carlile RN, Ohanlon JF, Collins SM Journal of Vacuum Science & Technology A, 14(2), 639, 1996 |
| 5 |
Fluid Simulations of Particle Contamination in Postplasma Processes Garrity MP, Peterson TW, Garrett LM, Ohanlon JF Journal of Vacuum Science & Technology A, 13(6), 2939, 1995 |
| 6 |
Postplasma Particle Dynamics in a Gaseous Electronics Conference RF Reference Cell Collins SM, Brown DA, Ohanlon JF, Carlile RN Journal of Vacuum Science & Technology A, 13(6), 2950, 1995 |
| 7 |
Ultrahigh-Vacuum in the Semiconductor Industry Ohanlon JF Journal of Vacuum Science & Technology A, 12(4), 921, 1994 |
| 8 |
Effects of Particle Clouds in a Plasma Etch System on Silicon Dioxide Wafer Contamination Collins SM, Ohanlon JF, Carlile RN Journal of Vacuum Science & Technology A, 12(4), 1397, 1994 |