화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Control of oxidation on NiSix during etching and ashing processes
Sakamori S, Yonekura K, Fujiwara N, Kosaka T, Ohkuni M, Tateiwa K
Thin Solid Films, 515(12), 4933, 2007
2 Suppression of 193-nm photoresist deformation by H-2 addition to fluorocarbon plasma in via-hole etching
Yonekura K, Yoshikawa K, Fujiwara Y, Sakamori S, Fujiwara N, Kosaka T, Ohkuni M, Tateiwa K
Thin Solid Films, 515(12), 5012, 2007