검색결과 : 2건
No. | Article |
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1 |
Control of oxidation on NiSix during etching and ashing processes Sakamori S, Yonekura K, Fujiwara N, Kosaka T, Ohkuni M, Tateiwa K Thin Solid Films, 515(12), 4933, 2007 |
2 |
Suppression of 193-nm photoresist deformation by H-2 addition to fluorocarbon plasma in via-hole etching Yonekura K, Yoshikawa K, Fujiwara Y, Sakamori S, Fujiwara N, Kosaka T, Ohkuni M, Tateiwa K Thin Solid Films, 515(12), 5012, 2007 |