검색결과 : 62건
| No. | Article |
|---|---|
| 1 |
Structure and Optical Properties of Layered Perovskite (MA)(2)PbI2-xBrx(SCN)(2) (0 <= x < 1.6) Yamamoto T, Oswald IWH, Savory CN, Ohmi T, Koegel AA, Scanlon DO, Kageyama H, Neilson JR Inorganic Chemistry, 59(23), 17379, 2020 |
| 2 |
Advanced Direct-Polishing Process Development of Non-Porous Ultralow-k Dielectric Fluorocarbon with Plasma Treatment on Cu Interconnects Gu X, Nemoto T, Tomita Y, Teramoto A, Kuroda R, Sugawa S, Ohmi T Journal of the Electrochemical Society, 159(4), H407, 2012 |
| 3 |
Visualization of Single Atomic Steps on An Ultra-Flat Si(100) Surface by Advanced Differential Interference Contrast Microscopy Kobayashi SI, Kim YG, Wen R, Yasuda K, Fukidome H, Suwa T, Kuroda R, Li X, Teramoto A, Ohmi T, Itaya K Electrochemical and Solid State Letters, 14(9), H351, 2011 |
| 4 |
Dependence of the Decomposition of Trimethylaluminum on Oxygen Concentration Yamashita S, Watanuki K, Ishii H, Shiba Y, Kitano M, Shirai Y, Sugawa S, Ohmi T Journal of the Electrochemical Society, 158(2), H93, 2011 |
| 5 |
Dependence of the Decomposition of Trimethylaluminumon Oxygen Concentration (vol 158, pg H93, 2010) Yamashita S, Watanuki K, Ishii H, Shiba Y, Kitano M, Shirai Y, Sugawa S, Ohmi T Journal of the Electrochemical Society, 158(5), S14, 2011 |
| 6 |
Tribological Study of Brush Scrubbing in Post-Chemical Mechanical Planarization Cleaning in Non-porous Ultralow-k Dielectric/Cu Interconnects Gu X, Nemoto T, Teramoto A, Sakuragi M, Sugawa S, Ohmi T Journal of the Electrochemical Society, 158(11), H1145, 2011 |
| 7 |
Very High Performance CMOS on Si(551) Using Radical Oxidation Technology and Accumulation-Mode SOI Device Structure Cheng WT, Teramoto A, Ohmi T Journal of the Electrochemical Society, 157(3), H389, 2010 |
| 8 |
Modelling of the hole mobility in p-channel MOS transistors fabricated on (110) oriented silicon wafers Gaubert P, Teramoto A, Ohmi T Solid-State Electronics, 54(4), 420, 2010 |
| 9 |
Characterization of MgZnO films grown by plasma enhanced metal-organic chemical vapor deposition Asahara H, Takamizu D, Inokuchi A, Hirayama M, Teramoto A, Saito S, Takahashi M, Ohmi T Thin Solid Films, 518(11), 2953, 2010 |
| 10 |
Three-Step Room-Temperature Cleaning of Bare Silicon Surface for Radical-Reaction-Based Semiconductor Manufacturing Hasebe R, Teramoto A, Kuroda R, Suwa T, Sugawa S, Ohmi T Journal of the Electrochemical Society, 156(1), H10, 2009 |