검색결과 : 16건
| No. | Article |
|---|---|
| 1 |
Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer Patterning Ashby PD, Olynick DL, Ogletree DF, Naulleau PP Advanced Materials, 27(38), 5813, 2015 |
| 2 |
High Aspect Ratio Sub-15 nm Silicon Trenches From Block Copolymer Templates Gu XD, Liu ZW, Gunkel I, Chourou ST, Hong SW, Olynick DL, Russell TP Advanced Materials, 24(42), 5688, 2012 |
| 3 |
Interface Segregating Fluoralkyl-Modified Polymers for High-Fidelity Block Copolymer Nanoimprint Lithography Voet VSD, Pick TE, Park SM, Moritz M, Hammack AT, Urban JJ, Ogletree DF, Olynick DL, Helms BA Journal of the American Chemical Society, 133(9), 2812, 2011 |
| 4 |
Electron-beam exposure mechanisms in hydrogen silsesquioxane investigated by vibrational spectroscopy and in situ electron-beam-induced desorption Olynick DL, Cord B, Schipotinin A, Ogletree DF, Schuck PJ Journal of Vacuum Science & Technology B, 28(3), 581, 2010 |
| 5 |
The Link Between Nanoscale Feature Development in a Negative Resist and the Hansen Solubility Sphere Olynick DL, Ashby PD, Lewis MD, Jen T, Lu HR, Liddle JA, Cha WL Journal of Polymer Science Part B: Polymer Physics, 47(21), 2091, 2009 |
| 6 |
Fabrication and performance of nanoscale ultrasmooth programed defects for extreme ultraviolet lithography Olynick DL, Salmassi F, Liddle JA, Mirkarimi PB, Spiller E, Baker SL, Robinson J Journal of Vacuum Science & Technology B, 26(1), 6, 2008 |
| 7 |
Extreme ultraviolet binary phase gratings: Fabrication and application to diffractive optics Salmassi F, Naulleau PP, Gullikson EM, Olynick DL, Liddle JA Journal of Vacuum Science & Technology A, 24(4), 1136, 2006 |
| 8 |
Scanning x-ray microscopy investigations into the electron-beam exposure mechanism of hydrogen silsesquioxane resists Olynick DL, Liddle JA, Tivanski AV, Gilles MK, Tyliszczak T, Salmassi F, Liang K, Leone SR Journal of Vacuum Science & Technology B, 24(6), 3048, 2006 |
| 9 |
Profile evolution of Cr masked features undergoing HBr-inductively coupled plasma etching for use in 25 nm silicon nanoimprint templates Olynick DL, Liddle JA, Rangelow IW Journal of Vacuum Science & Technology B, 23(5), 2073, 2005 |
| 10 |
Vapor-phase self-assembled monolayer for improved mold release in nanoimprint lithography Jung GY, Li ZY, Wu W, Chen Y, Olynick DL, Wang SY, Tong WM, Williams RS Langmuir, 21(4), 1158, 2005 |