검색결과 : 11건
| No. | Article |
|---|---|
| 1 |
Senolysis by glutaminolysis inhibition ameliorates various age-associated disorders Johmura Y, Yamanaka T, Omori S, Wang TW, Sugiura Y, Matsumoto M, Suzuki N, Kumamoto S, Yamaguchi K, Hatakeyama S, Takami T, Yamaguchi R, Shimizu E, Ikeda K, Okahashi N, Mikawa R, Suematsu M, Arita M, Sugimoto M, Nakayama KI, Furukawa Y, Imoto S, Nakanishi M Science, 371(6526), 265, 2021 |
| 2 |
Free-standing, roll-able, and transparent silicone polymer film prepared by using nanoparticles as cross-linking agents Iijima M, Omori S, Hirano K, Kamiya H Advanced Powder Technology, 24(3), 625, 2013 |
| 3 |
Binary Diffusion Coefficients of Aqueous Phenylalanine, Tyrosine Isomers, and Aminobutyric Acids at Infinitesimal Concentration and Temperatures from (293.2 to 333.2) K Umecky T, Ehara K, Omori S, Kuga T, Yui K, Funazukuri T Journal of Chemical and Engineering Data, 58(7), 1909, 2013 |
| 4 |
Enzymatic nanoreactors for environmentally benign biotransformations. 1. Formation and catalytic activity of supramolecular complexes of laccase and linear-dendritic block copolymers Gitsov I, Hamzik J, Ryan J, Simonyan A, Nakas JP, Omori S, Krastanov A, Cohen T, Tanenbaum SW Biomacromolecules, 9(3), 804, 2008 |
| 5 |
Effects of hydroxyl groups on binary diffusion coefficients of alpha-amino acids in dilute aqueous solutions Umecky T, Omori S, Kuga T, Funazukuri T Fluid Phase Equilibria, 264(1-2), 18, 2008 |
| 6 |
Liquid structure of the urea-water system studied by dielectric spectroscopy Hayashi Y, Katsumoto Y, Omori S, Kishii N, Yasuda A Journal of Physical Chemistry B, 111(5), 1076, 2007 |
| 7 |
Approach to full-chip simulation and correction of stencil mask distortion for proximity electron lithography Sawamura J, Suzuki K, Omori S, Ashida I, Ohnuma H Journal of Vacuum Science & Technology B, 22(6), 3092, 2004 |
| 8 |
Impacts of 30-nm-thick resist on improving resolution performance of low-energy electron beam lithography Yoshizawa M, Moriya S, Oguni K, Nakano H, Omori S, Kitagawa T, Kotera M, Niu H Journal of Vacuum Science & Technology B, 22(6), 3518, 2004 |
| 9 |
Complementary masking approach for proximity electron lithography Omori S, Iwase K, Amai K, Sasaki T, Hane H, Koike K, Nohama S, Ashida I, Kitagawa T, Moriya S Journal of Vacuum Science & Technology B, 21(1), 57, 2003 |
| 10 |
Photoelectron diffraction intensity calculation by using tensor low-energy electron diffraction theory Omori S, Nihei Y Journal of Vacuum Science & Technology A, 17(4), 1621, 1999 |