검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Profile evolution during polysilicon gate etching with low-pressure high-density Cl-2/HBr/O-2 plasma chemistries Tuda M, Shintani K, Ootera H Journal of Vacuum Science & Technology A, 19(3), 711, 2001 |
| 2 |
Large-diameter microwave plasma source excited by azimuthally symmetric surface waves Tuda M, Ono K, Ootera H, Tsuchihashi M, Hanazaki M, Komemura T Journal of Vacuum Science & Technology A, 18(3), 840, 2000 |
| 3 |
Transport mechanisms of ions and neutrals in low-pressure, high-density plasma etching of high aspect ratio contact holes Nishikawa K, Ootera H, Tomohisa S, Oomori T Thin Solid Films, 374(2), 190, 2000 |