화학공학소재연구정보센터
검색결과 : 326건
No. Article
1 Characterization of Reversed Arc Hydrocarbon Plasma in Material Processing
Avtaeva S, Gorokhovsky V
Plasma Chemistry and Plasma Processing, 41(3), 815, 2021
2 How Hydrogen Admixture Changes Plasma Jet Characteristics in Spray Processes at Low Pressure
Mauer G
Plasma Chemistry and Plasma Processing, 41(1), 109, 2021
3 Etching Characteristic of Graphite and Metal Substrates by Hydrocarbon Plasma in Closed Cavity
Long L, Zhou WX, Yang L, Zhu XM, Fu W
Plasma Chemistry and Plasma Processing, 41(2), 691, 2021
4 Plasma-Chemical Synthesis of Lead Sulphide Thin Films for Near-IR Photodetectors
Mochalov L, Logunov A, Prokhorov I, Sazanova T, Kudrin A, Yunin P, Zelentsov S, Letnianchik A, Starostin N, Boreman G, Vorotyntsev V
Plasma Chemistry and Plasma Processing, 41(1), 493, 2021
5 Correlation of hydrogen generation and optical emission properties of plasma in water photolysis on perovskite photocatalysts
Chung KH, Kim BJ, Kim SJ, Park YK, Jung SC
International Journal of Hydrogen Energy, 45(15), 8595, 2020
6 Coated stainless steel as bipolar plate material for anion exchange membrane fuel cells (AEMFCs)
Proch S, Stenstrom M, Eriksson L, Andersson J, Sjoblom G, Jansson A, Westlinder J
International Journal of Hydrogen Energy, 45(2), 1313, 2020
7 Characterization of Gaseous Plasma Sustained in Mixtures of HMDSO and O-2 in an Industrial-Scale Reactor
Gosar Z, Kovac J, Mozetic M, Primc G, Vesel A, Zaplotnik R
Plasma Chemistry and Plasma Processing, 40(1), 25, 2020
8 Microwave Plasma Jet in Water: Effect of Water Electrical Conductivity on Plasma Characteristics
Hamdan A, Profili J, Cha MS
Plasma Chemistry and Plasma Processing, 40(1), 169, 2020
9 Electrical and Optical Characterization of Acetylene RF CCP for Synthesis of Different Forms of Hydrogenated Amorphous Carbon Films
Aldeeb MA, Morgan N, Abouelsayed A, Amin KM, Hassaballa S
Plasma Chemistry and Plasma Processing, 40(1), 387, 2020
10 Phase-Resolved Measurement of Atmospheric-Pressure Radio-Frequency Pulsed Discharges in Ar/CH4/CO2 Mixture
Liu Z, Huang BD, Zhu WC, Zhang C, Tu X, Shao T
Plasma Chemistry and Plasma Processing, 40(4), 937, 2020