| 1 |
Chemo-mechanical coupling model of solid oxide fuel cell under high-temperature oxidation
Chen YP, Hao WQ, Wang FH
International Journal of Energy Research, 44(8), 7068, 2020 |
| 2 |
Reliable gate stack and substrate parameter extraction based on C-V measurements for 14 nm node FDSOI technology
Mohamad B, Leroux C, Rideau D, Haond M, Reimbold G, Ghibaudo G
Solid-State Electronics, 128, 10, 2017 |
| 3 |
Atomic layer deposition of tantalum oxide thin films using the precursor tert-butylimido-tris-ethylmethylamido-tantalum and water: Process characteristics and film properties
Henke T, Knaut M, Geidel M, Winkler F, Albert M, Bartha JW
Thin Solid Films, 627, 94, 2017 |
| 4 |
Analytical model for an asymmetric double-gate MOSFET with gate-oxide thickness and flat-band voltage variations in the subthreshold region
Shin YH, Yun I
Solid-State Electronics, 120, 19, 2016 |
| 5 |
An XPS study of bromine in methanol etching and hydrogen peroxide passivation treatments for cadmium zinc telluride radiation detectors
Babar S, Sellin PJ, Watts JF, Baker MA
Applied Surface Science, 264, 681, 2013 |
| 6 |
Role of film thickness on the properties of ZnO thin films grown by sol-gel method
Kumar V, Singh N, Mehra RM, Kapoor A, Purohit LP, Swart HC
Thin Solid Films, 539, 161, 2013 |
| 7 |
The electrical and structural properties of HfO2/SrTiO3 stacked gate dielectric with TiN metal gate electrode
Choi C, Choi R
Thin Solid Films, 521, 42, 2012 |
| 8 |
Drive current enhancement in p-tunnel FETs by optimization of the process conditions
Leonelli D, Vandooren A, Rooyackers R, De Gendt S, Heyns MM, Groeseneken G
Solid-State Electronics, 65-66, 28, 2011 |
| 9 |
X-ray Photoelectron Spectroscopy characterization of native and RCA-treated Si (111) substrates and their influence on surface chemistry of copper phthalocyanine thin films
Krzywiecki M, Grzadziel L, Peisert H, Biswas I, Chasse T, Szuber J
Thin Solid Films, 518(10), 2688, 2010 |
| 10 |
Atomic layer deposition of HfO2 on self-assembled monolayer-passivated Ge surfaces
Park K, Lee Y, Im KT, Lee JY, Lim S
Thin Solid Films, 518(15), 4126, 2010 |
