검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Deep ultraviolet resists AZ DX-561 and AZ DX-1300P applied for electron beam and masked ion beam lithography Hudek P, Kostic I, Belov M, Rangelow IW, Shi F, Pawlowski G, Spiess W, Buschbeck H, Cekan E, Eder S, Loschner H Journal of Vacuum Science & Technology B, 15(6), 2550, 1997 |
| 2 |
A Percolation View of Novolak Dissolution .3. Dissolution Inhibition Shih HY, Yeh TF, Reiser A, Dammel RR, Merrem HJ, Pawlowski G Macromolecules, 27(12), 3330, 1994 |
| 3 |
HEXAFLUOROACETONE IN RESIST CHEMISTRY PRZYBILLA KJ, ROSCHERT H, PAWLOWSKI G Advanced Materials, 4(3), 239, 1992 |