| 1 |
Multiscale modeling and neural network model based control of a plasma etch process
Xiao TQ, Ni D
Chemical Engineering Research & Design, 164, 113, 2020 |
| 2 |
Transparent, superhydrophobic, and wear-resistant surfaces using deep reactive ion etching on PDMS substrates
Ebert D, Bhushan B
Journal of Colloid and Interface Science, 481, 82, 2016 |
| 3 |
Virtual metrology modeling of time-dependent spectroscopic signals by a fused lasso algorithm
Park C, Kim SB
Journal of Process Control, 42, 51, 2016 |
| 4 |
Effect of reactor surface modification on the neutral gas temperature in a transformer-coupled toroidal plasma
You D, Lee YS, Lee JB, Chang HY
Current Applied Physics, 15(3), 183, 2015 |
| 5 |
Complete wetting characteristics of micro/nano dual-scale surface by plasma etching to give nanohoneycomb structure
Kim D, Lee S, Hwang W
Current Applied Physics, 12(1), 219, 2012 |
| 6 |
Real-time virtual metrology and control for plasma etch
Lynn SA, MacGearailt N, Ringwood JV
Journal of Process Control, 22(4), 666, 2012 |
| 7 |
Cl2/HBr/O2 고밀도 플라즈마에서 비정질 실리콘 게이트 식각공정 특성
이원규
Korean Chemical Engineering Research, 47(1), 79, 2009 |
| 8 |
Etching characteristics and mechanism of ZnO thin films in inductively coupled HBr/Ar plasma
Ham YH, Efremov A, Yun SJ, Kim JK, Min NK, Kwon KH
Thin Solid Films, 517(14), 4242, 2009 |
| 9 |
Utilization of TXRF analytical technique in order to improve front-end semiconductor processing
Budri T
Applied Surface Science, 254(15), 4768, 2008 |
| 10 |
Profile simulation of high aspect ratio contact etch
Kim D, Hudson EA, Cooperberg D, Edelberg E, Srinivasan M
Thin Solid Films, 515(12), 4874, 2007 |
