검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Mathematical modeling of soft baking in photoresist processing Lin SH, Liu BT, Chen WC, Hsu JP Journal of the Electrochemical Society, 145(12), 4256, 1998 |
| 2 |
Dissolution characteristics of chemically amplified 193 nm resists Itani T, Yoshino H, Hashimoto S, Yamana M, Miyasaka M, Tanabe H Journal of Vacuum Science & Technology B, 16(6), 3726, 1998 |
| 3 |
Self-Developing Characteristics of Si Containing Polymers and Their Application to X-Ray-Lithography Yamaguchi A, Ogawa T, Tachibana H, Oizumi H, Soga T, Matsumoto M, Matsuzaka T, Takeda E Journal of the Electrochemical Society, 143(2), 657, 1996 |
| 4 |
Mathematical-Modeling and Experimental Characterization of Polymer Dissolution Peppas NA, Wu JC, Vonmeerwall ED Macromolecules, 27(20), 5626, 1994 |