검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
A low-thermal-budget in situ doped multilayer silicon epitaxy process for MOSFET channel engineering Ban I, Ozturk MC, Misra V, Wortman JJ, Venables D, Maher DM Journal of the Electrochemical Society, 146(3), 1189, 1999 |
| 2 |
Effects of Low-Dose Silicon, Carbon, and Oxygen Implantation Damage on Diffusion of Phosphorus in Silicon Chaudhry S, Law ME Journal of the Electrochemical Society, 141(12), 3516, 1994 |