검색결과 : 10건
| No. | Article |
|---|---|
| 1 |
2D compositional self-patterning in magnetron sputtered thin films Garcia-Valenzuela A, Alvarez R, Rico V, Espinos JP, Lopez-Santos MC, Solis J, Siegel J, del Campo A, Palmero A, Gonzalez-Elipe AR Applied Surface Science, 480, 115, 2019 |
| 2 |
SiOx by magnetron sputtered revisited: Tailoring the photonic properties of multilayers Garcia-Valenzuela A, Alvarez R, Espinos JP, Rico V, Gil-Rostra J, Palmero A, Gonzalez-Elipe AR Applied Surface Science, 488, 791, 2019 |
| 3 |
Perspectives on oblique angle deposition of thin films: From fundamentals to devices Barranco A, Borras A, Gonzalez-Elipe AR, Palmero A PROGRESS IN MATERIALS SCIENCE, 76, 59, 2016 |
| 4 |
Enhancement of visible light-induced surface photo-activity of nanostructured N-TiO2 thin films modified by ion implantation Romero-Gomez P, Lopez-Santos C, Borras A, Espinos JP, Palmero A, Gonzalez-Elipe AR Chemical Physics Letters, 582, 95, 2013 |
| 5 |
On the argon and oxygen incorporation into SiOx through ion implantation during reactive plasma magnetron sputter deposition van Hattum ED, Boltje DB, Palmero A, Arnoldbik WM, Rudolph H, Habraken FHPM Applied Surface Science, 255(5), 3079, 2008 |
| 6 |
On-line characterisation of radiofrequency magnetron sputter deposition of SiOx using elastic recoil detection van Hattum ED, Arnoldbik WM, Palmero A, Habraken FHPM Thin Solid Films, 494(1-2), 13, 2006 |
| 7 |
Characterization of an Ar/O-2 magnetron sputtering plasma using a Langmuir probe and an energy resolved mass spectrometer Palmero A, van Hattum ED, Rudolph H, Habraken FHPM Thin Solid Films, 494(1-2), 18, 2006 |
| 8 |
Study of the gas rarefaction phenomenon in a magnetron sputtering system Palmero A, Rudolph H, Habraken FHPM Thin Solid Films, 515(2), 631, 2006 |
| 9 |
Study of the a-Si/a-SiO2 interface deposited by r.f. magnetron sputtering Tomozeiu N, van Faassen EE, Palmero A, Arnoldbik WM, Vredenberg AM, Habraken FHPM Thin Solid Films, 447, 306, 2004 |
| 10 |
Electron temperature measurement in a slot antenna 2.45 GHz microwave plasma source Cotrino J, Palmero A, Rico V, Barranco A, Espinos JP, Gonzalez-Elipe AR Journal of Vacuum Science & Technology B, 19(2), 410, 2001 |