화학공학소재연구정보센터
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No. Article
1 Metal-oxide-semiconductor devices on p-type Ge with La2O3 and ZrO2/La2O3 as gate dielectric and the effect of postmetallization anneal
Galata SF, Mavrou G, Tsipas P, Sotiropoulos A, Panayiotatos Y, Dimoulas A
Journal of Vacuum Science & Technology B, 27(1), 246, 2009
2 Germanium FETs and capacitors with rare earth CeO2/HfO2 gates
Dimoulas A, Panayiotatos Y, Sotiropoulos A, Tsipas P, Brunco DP, Nicholas G, Van Steenbergen J, Bellenger F, Houssa M, Caymax M, Meuris M
Solid-State Electronics, 51(11-12), 1508, 2007
3 Interface engineering for Ge metal-oxide-semiconductor devices
Dimoulas A, Brunco DP, Ferrari S, Seo JW, Panayiotatos Y, Sotiropoulos A, Conard T, Caymax M, Spiga S, Fanciulli M, Dieker C, Evangelou EK, Galata S, Houssa M, Heyns MM
Thin Solid Films, 515(16), 6337, 2007
4 Electrical properties of atomic-beam deposited GeO1-xNx/HfO2 gate stacks on Ge
Houssa M, Conard T, Bellenger F, Mavrou G, Panayiotatos Y, Sotiropoulos A, Dimoulas A, Meuris M, Caymax M, Heyns MM
Journal of the Electrochemical Society, 153(12), G1112, 2006
5 Raman and photoluminescence study of magnetron sputtered amorphous carbon films
Papadimitriou D, Roupakas G, Xue C, Topalidou A, Panayiotatos Y, Dimitriadis CA, Logothetidis S
Thin Solid Films, 414(1), 18, 2002